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US20150212433 |
PELLICLE
A pellicle includes a first frame affixing a reticle, the first frame having a tapered locking groove, a second frame on the first frame, the second frame having a locking portion that is... |
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US20150168844 |
MIRROR ARRANGEMENT FOR A LITHOGRAPHY APPARATUS AND METHOD FOR PRODUCING THE SAME
A method for producing a mirror arrangement for a lithography apparatus is proposed, which comprises the following steps: producing a mirror body having a cavity delimited by a front wall, a rear... |
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US20110001954 |
CHUCKING SYSTEM WITH RECESSED SUPPORT FEATURE
In an imprint lithography system, a recessed support on a template chuck may alter a shape of a template positioned thereon providing minimization and/or elimination of premature downward... |
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US20120140199 |
MECHANICAL FIXTURE OF PELLICLE TO LITHOGRAPHIC PHOTOMASK
A pellicle frame is mechanically attached to a reticle, without use of an adhesive. An embodiment includes mechanically attaching a pellicle frame to a front surface of a reticle, removing the... |
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US20130176549 |
Reticle Operation System
A system for operating EUV mask stored in reticle SMIF pod and/or dual pod is provided, wherein the reticle SMIF pod and Dual pod are for storing EUV mask. The system can be a sorter for EUV mask... |
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US20150205193 |
PELLICLE FOR EUV, AND AN ASSEMBLY INCLUDING THE PELLICLE, AND A METHOD FOR ASSEMBLING THE SAME
Here are disclosed a pellicle for EUV and an assembly made up of this pellicle and a mask, which brings about a projection of low contrast (intensity) shadows of a mesh structure on the mask, thus... |
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US20130265557 |
TEMPERATURE CONTROL IN EUV RETICLE INSPECTION TOOL
An apparatus comprises an optics assembly and a plate. The optics assembly configured to focus light from an EUV source onto a reticle or sensor. The plate has an opening to allow the EUV light to... |
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US20120069317 |
LITHOGRAPHY SYSTEM ARRANGED ON A FOUNDATION, AND METHOD FOR ARRANGING A LITHOGRAPHY SYSTEM ON SAID FOUNDATION
The invention relates to a vibration isolation requiring system, such as a lithography system, arranged on a foundation, for example part of the floor in the room where the lithography system is... |
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US20100328635 |
Pellicle
There is provided a pellicle having a rectangular pellicle frame formed of four side bars, having a through hole made through at least one of the frame bars for adjusting a pressure of a space... |
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US20110122375 |
MULTICOLOR HOLGRAPHIC REPLICATION BY MASKING
A multicolor hologram (e.g., a two-color hologram) is replicated (copied) into a photosensitive layer by masking to produce a copy (replicate) of the hologram in a manner such that the copy is an... |
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US20130286365 |
METHOD AND STRUCTURE FOR AUTOMATED INERT GAS CHARGING IN A RETICLE STOCKER
At least a first reticle is stored in a housing of a stocker. A first gas is delivered to the housing. At least one reticle pod having an additional reticle is delivered into a enclosure within... |
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US20140307237 |
PELLICLE FRAME AND PELLICLE WITH THIS
A pellicle is proposed in which the frame is made of an aluminum alloy and at least the inner wall of the frame is entirely coated with a pure aluminum layer, which preferably has a purity of... |
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US20130070226 |
MARKER STRUCTURE AND METHOD OF FORMING THE SAME
The invention relates to a marker structure for optical alignment of a substrate and provided thereon. The marker structure has a first reflecting surface at a first level and a second reflecting... |
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US20100328641 |
PELLICLE FRAME AND LITHOGRAPHIC PELLICLE
A pellicle frame is provided that includes a pellicle frame bar having a cross-section with a shape that has at least one triangular recess in at least one side edge of a quadrilateral having an... |
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US20120127442 |
DETERMINING LITHOGRAPHIC SET POINT USING OPTICAL PROXIMITY CORRECTION VERIFICATION SIMULATION
The subject matter disclosed herein relates to determining a lithographic set point using simulations of optical proximity correction verification. In one embodiment, a computer-implemented method... |
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US20110063601 |
PELLICLE FRAME, PELLICLE, LITHOGRAPHY APPARATUS, AND METHOD OF FABRICATING THE PELLICLE FRAME
A pellicle frame, including aluminum, aluminum oxide, and a transition metal. |
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US20150036117 |
MASKLESS NANOIMPRINT LITHOGRAPHY
A method for creating a nanoimprint lithography template includes exposing (600) a mass transport layer of material adjacent to a support substrate to electromagnetic radiation in a predetermined... |
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US20150085266 |
DIFFERENTIAL DOSE AND FOCUS MONITOR
A dose and focus monitor structure includes at least one complementary set of unit dose monitors and at least one complementary set of unit focus monitors. Each complementary set of unit dose... |
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US20140078478 |
METHOD OF OPTIMIZING LITHOGRAPHY TOOLS UTILIZATION
A lithography cluster includes at least two lithography cells having a first lithography cell and a second lithography cell, an interface unit configured to integrate with the first lithography... |
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US20140362363 |
METHODS FOR MONITORING SOURCE SYMMETRY OF PHOTOLITHOGRAPHY SYSTEMS
A method for monitoring the source symmetry of a photolithography system is provided. The method includes providing a first reticle; and providing a second reticle. The method also includes... |
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US20110300490 |
HIGH-RESOLUTION MICROSCOPY AND PHOTOLITHOGRAPHY DEVICES USING FOCUSING MICROMIRRORS
The invention relates to large-field high-resolution microscopy and photolithography setups operating with polychromatic light. It includes the use of a plurality of focusing micromirrors. |
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US20140085618 |
PARTICLE CONTROL NEAR RETICLE AND OPTICS USING SHOWERHEAD
A method and an apparatus to protect a reticle against particles and chemicals in an actinic EUV reticle inspection tool are presented. The method and apparatus utilizes a pair of porous metal... |
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US20110216299 |
ELECTROSTATIC LENS STRUCTURE
An electrostatic lens comprising a first conductive plate with a first aperture, a second conductive plate with a second aperture, the second aperture being substantially aligned with the first... |
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US20120200835 |
RETICLE PROTECTION MEMBER, RETICLE CARRYING DEVICE, EXPOSURE DEVICE AND METHOD FOR CARRYING RETICLE
A position measurement device measures the position of a position measurement mark formed on the lower surface of a reticle, thereby measuring the position of the reticle. A position measurement... |
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US20060077361 |
Means of removing particles from a membrane mask in a vacuum
A method of removing particles from a membrane reticle by a laser beam or beams. The particles on the bottom of the reticle are knocked off and fall away and particles on the top are removed a... |
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US20130182236 |
IMPRINT LITHOGRAPHY
An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame,... |
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US20120176588 |
Immersion Lithography Apparatus and Tank Thereof
A tank for an immersion lithography apparatus provided. The tank has a container with a bottom plate and side plates connected to each, wherein the side plates surround and connect all edges of... |
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US20150092174 |
ILLUMINATION OPTICAL UNIT
An illumination optical unit comprises a first faceted element and a second faceted element having a multiplicity of displaceable micromirrors which can be grouped flexibly to form facets. |
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US20120162628 |
Actuator
An actuator comprising a first part and a second part, the first part being configured to move relative to the second part, wherein a labyrinth seal is provided between the first part and the... |
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US20120224156 |
METHOD OF CORRECTING FLARE AND METHOD OF PREPARING EXTREME ULTRA VIOLET MASK
A method of correcting flare includes measuring flare of a test pattern, calculating point spread functions (PSFs) of the flare as a function of distance, and correcting the flare using... |
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US20130114061 |
DOUBLE PASS INTERFEROMETRIC ENCODER SYSTEM
An encoder head includes one or more components arranged to: i) direct a first incident beam to the diffractive encoder scale at a first incident angle with respect to the encoder scale; ii)... |
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US20110123937 |
COMPOSITIONS AND PROCESSES FOR IMMERSION LITHOGRAPHY
The present invention relates to barrier layer compositions that are applied above a photoresist composition for immersion lithography processing. In a further aspect, new methods are provided for... |
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US20150049323 |
Lithographic Apparatus
A lithographic apparatus injects gas between a reticle (MA) and reticle blades (REB-X, REB-Y) to protect the reticle from contamination. The gas may be injected either into the space defined... |
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US20100328636 |
Producing a Marker Pattern and Measurement of an Exposure-Related Property of an Exposure Apparatus
In order to determine whether an exposure apparatus is projecting patterns correctly, a marker pattern is used on a mask for printing a specific marker structure onto a substrate. This marker is... |
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US20150212432 |
Reticle Heater to Keep Reticle Heating Uniform
Systems and methods are disclosed for controlling the heating of a reticle. In one embodiment, a plurality of radiation sources generates a plurality of radiation beams (206) and delivers them to... |
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US20130229638 |
SYSTEM AND METHOD FOR LITHOGRAPHY PATTERNING
Disclosed is a lithography system. The lithography system includes a lithography exposure tool designed for performing an exposure process to a radiation-sensitive material layer coated on an... |
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US20150131072 |
LOW CONTACT IMPRINT LITHOGRAPHY TEMPLATE CHUCK SYSTEM FOR IMPROVED OVERLAY CORRECTION
Imprint lithography template chucks and related systems and methods are provided that substantially maintain structural support functions while significantly enhancing imprint quality functions.... |
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US20120013881 |
Method and Apparatus for Determining an Overlay Error
A method of determining an overlay error. Measuring an overlay target having process-induced asymmetry. Constructing a model of the target. Modifying the model, e.g., by moving one of the... |
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US20130038852 |
RETICLE REMOVING APPARATUS AND RETICLE REMOVING METHOD USING THE SAME
A reticle removing apparatus adapted to remove a reticle in a reticle library of an exposure apparatus is provided. The reticle removing apparatus includes a bracket and a reticle removing module... |
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US20120050711 |
CHUCK ASSEMBLY BACK SIDE RETICLE CLEANER
An improved technique for fixedly holding a reticle in a reticle chuck of the reticle simplifies the process of cleaning the back surface of the reticle by exposing the entire back surface. The... |
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US20150015862 |
ILLUMINATION OPTICAL UNIT FOR PROJECTION LITHOGRAPHY
An illumination optical unit for projection lithography illuminates an illumination field with illumination light of a primary light source. The illumination optical unit has a raster arrangement... |
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US20110051114 |
OPTIMIZED POLARIZATION ILLUMINATION
Disclosed concepts include a method of optimizing polarization of an illumination of a pattern to be formed in a surface of a substrate. Polarized illumination is optimized by determining an... |
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US20130128254 |
Thermally Stable Optical Sensor Mount
Disclosed is an apparatus including a mechanical reference frame and a rigid object mechanically coupled to the reference frame by two or more constraints. The stiffnesses of at least two of the... |
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US20130100428 |
MASK FOR EUV LITHOGRAPHY, EUV LITHOGRAPHY SYSTEM AND METHOD FOR OPTIMISING THE IMAGING OF A MASK
A mask (105) for EUV lithography includes a substrate (107), a multi-layer coating (108) applied to the substrate (107) and a mask structure (109) which is applied to the multi-layer coating (108)... |
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US20110141450 |
Method and Apparatus for Overlay Measurement
A method of measurement of at-resolution overlay offset may be implemented in a scatterometer. At least three targets are provided on a wafer, each target comprising a first marker grating and a... |
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US20150085264 |
ROTARY EUV COLLECTOR
An EUV collector is rotated between or during operations of an EUV photolithography system. Rotating the EUV collector causes contamination to distribute more evenly over the collector's surface.... |
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US20150085268 |
Extreme Ultraviolet Lithography Process And Mask
A system of an extreme ultraviolet lithography (EUVL) is disclosed. an extreme ultraviolet lithography (EUVL) system includes an extreme ultraviolet (EUV) reflection-type mask having a patterned... |
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US20140268092 |
Extreme Ultraviolet Lithography Process and Mask
A process of an extreme ultraviolet lithography (EUVL) is disclosed. The process includes receiving an extreme ultraviolet (EUV) mask with multiple states. These different states of the EUV mask... |
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US20070109520 |
Modular illuminator for a scanning printer
Disclosed herewith is a system and method for building an illuminator for a scanning printer. The design is modular enabling any of a number of different sources to be used with common partial... |
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US20110069288 |
Reticle Transport Apparatus, Exposure Apparatus, Reticle Transport Method, and Reticle Processing Method
A reticle transport apparatus transports a reticle to and from a processing atmosphere. A reticle loader loads the reticle into the processing atmosphere, with at least a portion of the reticle... |